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Ships within 48 hours · Estimated delivery Aug 9 - Aug 14
Second Position Etch optional
patented pucker-free taped seams
A concave circular arch creates a perfect base for this extraordinary crystal piece
etching area on the apple is very restrictive
Staggered edges of our Icebergs help give the piece depth and texture
000159 Devon and Jones CrownLux Performance® Men's Plaited Polo Over-night Trip Second Position Etch optional5 oz. yd2 172 gsm, 100% polyester face plaited to 60% polyester, 40% cotton back (total overall garment 61% polyester, 39% cotton); Proprietary dual sided mesh pique knit constructed of fine denier wicking polyester on the outside and soft as cotton wicking blend on the inside; Moisture wicking performance with UV 15 39 protection; Matching flat knit collar; Luxury, comfort and performance in one; Three button placket; Dyed to match buttons; Imprint